Nanotemplate alumina films on a silicon substrate fabricated by electrochemistry

被引：2

作者：

Kokonou, M ^{[1
]}

Nassiopoulou, AG ^{[1
]}

Giannakopoulos, KP ^{[1
]}

Boukos, N ^{[1
]}

机构：

[1] NCSR Demokritos, IMEL, Athens 15310, Greece

来源：

SECOND CONFERENCE ON MICROELECTRONICS, MICROSYSTEMS AND NANOTECHNOLOGY | 2005年 / 10卷

关键词：

D O I：

10.1088/1742-6596/10/1/039

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The anodization process for the formation of very thin porous alumina films on Si was investigated in detail in this paper. The evolution of current density versus time during anodization was first investigated, and Transmission Electron Microscopy was used to characterize the samples at different anodization times before full Al consumption. Anodization was performed in two different electrolytes and the obtained films were compared.

引用

页码：159 / 162

页数：4

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