Particle-free superconducting Bi2Sr2CaCu2Ox ultrathin films prepared by atomic-layer-controlled molecular beam epitaxy technique

被引：13

作者：

Ota, H ^{[1
]}

Migita, S ^{[1
]}

Kasai, Y ^{[1
]}

Matsuhata, H ^{[1
]}

Sakai, S ^{[1
]}

机构：

[1] Electrotech Lab, Ibaraki, Osaka 3058568, Japan

来源：

PHYSICA C | 1999年 / 311卷 / 1-2期

关键词：

Bi-based cuprates; BSCCO; ultrathin films; molecular beam epitaxy; atomic-layer-controlled growth;

D O I：

10.1016/S0921-4534(98)00606-6

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Atomic-layer-controlled molecular beam epitaxy (ALC-MBE) technique is applied for preparing Bi2Sr2CaCu2Ox ultrathin films. Precise control of the composition by ALC-MBE enables successful growth of particle-free ultrathin films. Superconducting zero-resistance transitions are observed for the films more than 3.0 nm in thickness. It is also shown that growth of a Bi2Sr2CuOy buffer layer between the film and SrTiO3(100) substrate contributes to preparing such particle-free ultrathin films with good superconducting properties. (C) 1999 Elsevier Science B.V. All rights reserved.

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收藏

页码：42 / 48

页数：7

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