Bottom-up strategy of materials fabrication: a new trend in nanotechnology of soft materials

被引:301
作者
Shimomura, M [1 ]
Sawadaishi, T
机构
[1] Hokkaido Univ, Res Inst Elect Sci, Sapporo, Hokkaido 0600812, Japan
[2] Riken Inst Phys & Chem Res, Spatiotemporal Funct Mat Res Grp, Frontier Res Syst, Wako, Saitama 3510198, Japan
关键词
molecular self-assembly; nano-technology; mesoscopic patterning; dissipative structure; self-organization;
D O I
10.1016/S1359-0294(00)00081-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Recent progresses in nanometer-scale molecular self-organization and mesoscopic pattern formation are reviewed from the view point of nanotechnology of bottom-up materials fabrication. Nanometer-scale layer-by-layer self-assemblies on nanoparticles will provide wide applications in many fields. The micro-contact printing technique is effectively used for up-sizing the nanostructured molecular assemblies as submicrometer- and micrometer-scale patterns. Dissipative structures formed in non-equilibrium systems as self-organized spatio-temporal structures are newly employed for the mesoscopic patterning of the nanostructured molecular assemblies. (C) 2001 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:11 / 16
页数:6
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