Bottom-up strategy of materials fabrication: a new trend in nanotechnology of soft materials

被引：301

作者：

Shimomura, M ^{[1
]}

Sawadaishi, T

机构：

[1] Hokkaido Univ, Res Inst Elect Sci, Sapporo, Hokkaido 0600812, Japan

[2] Riken Inst Phys & Chem Res, Spatiotemporal Funct Mat Res Grp, Frontier Res Syst, Wako, Saitama 3510198, Japan

来源：

CURRENT OPINION IN COLLOID & INTERFACE SCIENCE | 2001年 / 6卷 / 01期

关键词：

molecular self-assembly; nano-technology; mesoscopic patterning; dissipative structure; self-organization;

D O I：

10.1016/S1359-0294(00)00081-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Recent progresses in nanometer-scale molecular self-organization and mesoscopic pattern formation are reviewed from the view point of nanotechnology of bottom-up materials fabrication. Nanometer-scale layer-by-layer self-assemblies on nanoparticles will provide wide applications in many fields. The micro-contact printing technique is effectively used for up-sizing the nanostructured molecular assemblies as submicrometer- and micrometer-scale patterns. Dissipative structures formed in non-equilibrium systems as self-organized spatio-temporal structures are newly employed for the mesoscopic patterning of the nanostructured molecular assemblies. (C) 2001 Elsevier Science Ltd. All rights reserved.

引用

页码：11 / 16

页数：6