Current-voltage characteristics of Schottky barriers with barrier heights larger than the semiconductor band gap:: The case of NiGe/n-(001)Ge contact -: art. no. 113706

被引:39
作者
Chi, DZ
Lee, RTP
Chua, SJ
Lee, SJ
Ashok, S
Kwong, DL
机构
[1] Inst Mat Res & Engn, Singapore 117602, Singapore
[2] Natl Univ Singapore, Silicon Nano Device Lab, Dept Elect & Comp Engn, Singapore 119260, Singapore
[3] Penn State Univ, Dept Engn Sci, University Pk, PA 16802 USA
[4] Univ Texas, Dept Elect & Comp Engn, Austin, TX 78752 USA
关键词
D O I
10.1063/1.1923162
中图分类号
O59 [应用物理学];
学科分类号
摘要
Current-voltage-temperature characterization has been performed on NiGe/n-(100)Ge Schottky contacts that were formed by the solid-state reaction of Ni with Ge. An effective barrier height of 0.732-0.735 eV, which is larger than the band-gap 0.66 eV of Ge, was obtained. A physical model describing the current transport mechanism in a Schottky contact with a barrier height larger than the semiconductor band gap is proposed and discussed on the basis of thermionic-field emission as the dominant transport mechanism. The observation of a barrier height larger than the semiconductor band gap should be of technological importance as it suggests that NiGe is an ideal contact and Schottky source/drain material in Ge-based p-metal-oxide-semiconductor field-effect-transistors. (C) 2005 American Institute of Physics.
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