Relative angle determinable stitching interferometry for hard x-ray reflective optics

被引：120

作者：

Mimura, H

Yumoto, H

Matsuyama, S

Yamamura, K

Sano, Y

Ueno, K

Endo, K

Mori, Y

Yabashi, M

Tamasaku, K

Nishino, Y

Ishikawa, T

Yamauchi, K

机构：

[1] Osaka Univ, Grad Sch Engn, Dept Precis Sci & Technol, Osaka 5650871, Japan

[2] Osaka Univ, Grad Sch Engn, Res Ctr Ultraprecis Sci & Technol, Osaka 5650871, Japan

[3] Japan Synchrotron Radiat Res Inst, SPring 8, Mikazuki, Hyogo 6795148, Japan

[4] RIKEN, SPring 8, Mikazuki, Hyogo 6795148, Japan

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 2005年 / 76卷 / 04期

关键词：

D O I：

10.1063/1.1868472

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Metrology plays an important role in surface figuring with subnanometer accuracy. We have developed relative angle determinable stitching interferometry for the surface figuring of elliptical mirrors, in order to realize hard x-ray nanofocusing. In a stitching system, stitching angles are determined not by the general method using a common area between neighboring shots, but by the new method using the mirror's tilt angles measured at times when profile data are acquired. The high measurement accuracy of approximately 4 nm (peak-to-valley) was achieved in the measurement of a cylindrical surface having the same curvature as the elliptically designed shape to enable hard x-ray nanofocusing. (C) American Institute of Physics.

引用

页数：6

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