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Image quality improvement in a hard X-ray projection microscope using total reflection mirror optics

被引：28
作者：
Mimura, H
Yamauchi, K
Yamamura, K
Kubota, A
Matsuyama, S
Sano, Y
Ueno, K
Endo, K
Nishino, Y
Tamasaku, K
Yabashi, M
Ishikawa, T
Mori, Y
机构：
[1] Osaka Univ, Dept Precis Sci & Technol, Osaka 5650871, Japan
[2] Osaka Univ, Res Ctr Ultraprecis Sci & Technol, Osaka 5650871, Japan
[3] Japan Synchrotron Radiat Res Inst, SPring 8, Mikazuki, Hyogo 6795198, Japan
[4] RIKEN, SPring 8, Mikazuki, Hyogo 6795198, Japan
来源：
JOURNAL OF SYNCHROTRON RADIATION | 2004年 / 11卷
关键词：
X-ray projection microscopes; coherent X-rays; Xx-ray focusing; wave-optical simulation; EEM; MSI;
D O I：
10.1107/S090904950401283X
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
A new figure correction method has been applied in order to fabricate an elliptical mirror to realize a one-dimensionally diverging X-ray beam having high image quality. Mutual relations between figure errors and intensity uniformities of diverging X-ray beams have also been investigated using a wave-optical simulator and indicate that figure errors in relatively short spatial wavelength ranges lead to high-contrast interference fringes. By using a microstitching interferometer and elastic emission machining, figure correction of an elliptical mirror with a lateral resolution close to 0.1 mm was carried out. A one-dimensional diverging X-ray obtained using the fabricated mirror was observed at SPring-8 and evaluated to have a sufficiently flat intensity distribution.
引用
收藏
页码：343 / 346
页数：4
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