Experimentally constrained molecular relaxation: The case of hydrogenated amorphous silicon

被引:24
作者
Biswas, Parthapratim [1 ]
Atta-Fynn, Raymond
Drabold, D. A.
机构
[1] Univ So Mississippi, Dept Phys & Astron, Hattiesburg, MS 39401 USA
[2] Univ Texas, Dept Phys & Astron, Arlington, TX 76019 USA
[3] Ohio Univ, Dept Phys & Astron, Athens, OH 45701 USA
基金
美国国家科学基金会;
关键词
D O I
10.1103/PhysRevB.76.125210
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have extended our experimentally constrained molecular relaxation technique [P. Biswas , Phys. Rev. B 71, 54204 (2005)] to hydrogenated amorphous silicon: a 540-atom model with 7.4% hydrogen and a 611-atom model with 22% hydrogen were constructed. Starting from a random configuration, using physically relevant constraints, ab initio interactions, and the experimental static structure factor, we construct realistic models of hydrogenated amorphous silicon. Our models confirm the presence of a high-frequency localized band in the vibrational density of states due to Si-H vibration that has been observed in recent vibrational transient grating measurements on plasma enhanced chemical vapor deposited films of hydrogenated amorphous silicon.
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页数:5
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