Formation of ordered mesoscopic patterns in polymer cast films by dewetting

被引:59
作者
Karthaus, O [1 ]
Grasjo, L [1 ]
Maruyama, N [1 ]
Shimomura, M [1 ]
机构
[1] Hokkaido Univ, Res Inst Elect Sci, Kita Ku, Sapporo, Hokkaido, Japan
关键词
dissipative structure; dewetting; hydrophobic polymer; mesoscopic pattern; nanosize dot;
D O I
10.1016/S0040-6090(98)00771-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ordered arrays of polymer aggregates can be prepared by a simple process: rinsing of smooth hydrophilic surfaces with a dilute solution of a hydrophobic polymer. The patterns consist of submicron-size polymer aggregates which can form superlattices over several tens of micrometers, thus self-assembling several hundred aggregates in an orderly fashion. Atomic force microscopy shows that the structures consist of isolated 'polymer islands', separated by the bare substrate. The ordering of the aggregates can be explained by the formation of regular, dissipative structures caused by convection during the evaporation of the solvent, followed by dewetting of the hydrophobic polymer solution from the smooth hydrophilic surface. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:829 / 832
页数:4
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