Multiple scattering effects on X-ray photoelectron diffraction from Si(111) root 3x root 3-Ag and -Sb surfaces

被引:15
作者
Chen, X [1 ]
Abukawa, T [1 ]
Kono, S [1 ]
机构
[1] TOHOKU UNIV,SCI MEASUREMENTS RES INST,SENDAI,MIYAGI 98077,JAPAN
关键词
antimony; electron-solid interactions; scattering; diffraction; low index single crystal surfaces; metal-semiconductor interfaces; photoelectron diffraction; silicon; silver;
D O I
10.1016/0039-6028(96)00036-2
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The effects of multiple scattering (MS) on X-ray photoelectron diffraction (XPD) from Si(111)root 3 x root 3-Ag and -Sb (referred to as root 3-Ag and -Sb) surfaces have been studied using a MS concentric-shell algorithm for sufficiently large clusters. Significant MS effects that cannot be reconciled by a kinematical treatment have been seen for the root 3-Ag surface, but not for the root 3-Sb surface. This indicates that previous XPD studies on the root 3-Ag surface were incomplete due to the failure of single scattering theory, and explains why prior XPD studies on this surface were not successful at first in predicting a presently widely accepted model. With a reliability factor analysis for MS simulations, we have shown that the root 3-Ag surface is formed in a honeycomb-chained-trimer model with its structural parameters consistent with those from other techniques.
引用
收藏
页码:28 / 38
页数:11
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