Air sensitive tin dioxide thin films by magnetron sputtering and thermal oxidation technique

被引：41

作者：

Shishkin, NY ^{[1
]}

Zharsky, IM ^{[1
]}

Lugin, VG ^{[1
]}

Zarapin, VG ^{[1
]}

机构：

[1] Belorussian State Univ Technol, Minsk 220630, BELARUS

来源：

SENSORS AND ACTUATORS B-CHEMICAL | 1998年 / 48卷 / 1-3期

关键词：

tin dioxide; thin films; oxygen sensitivity;

D O I：

10.1016/S0925-4005(98)00104-X

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

By the method of magnetron sputtering of metal tin and oxidation of the layer, a thin film of non-porous stoichiometric tin dioxide was obtained. Sensitive properties of the films to air oxygen in the temperature interval of 150-300 degrees C were investigated. The phenomena of conductivity type changing versus oxygen pressure was found. (C) 1998 Elsevier Science S.A. All rights reserved.

引用

页码：403 / 408

页数：6

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