Structure of the ultrathin aluminum oxide film on NiAl(110)

被引:327
作者
Kresse, G
Schmid, M
Napetschnig, E
Shishkin, M
Köhler, L
Varga, P
机构
[1] Univ Vienna, Inst Mat Phys, A-1090 Vienna, Austria
[2] Univ Vienna, Ctr Computat Mat Sci, A-1090 Vienna, Austria
[3] Vienna Univ Technol, Inst Allgemeine Phys, A-1040 Vienna, Austria
关键词
D O I
10.1126/science.1107783
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
The well-ordered aluminum oxide film formed by oxidation of the NiA[(110) surface is the most intensely studied metal surface oxide, but its structure was previously unknown. We determined the structure by extensive ab initio modeling and scanning tunneling microscopy experiments. Because the topmost aluminum atoms are pyramidally and tetrahedrally coordinated, the surface is different from all Al2O3 bulk phases. The film is a wide-gap insulator, although the overall stoichiometry of the film is not Al2O3 but Al10O13. We propose that the same building blocks can be found on the surfaces of bulk oxides, such as the reduced corundum (0001) surface.
引用
收藏
页码:1440 / 1442
页数:3
相关论文
共 23 条
  • [1] Imaging the atomic arrangements on the high-temperature reconstructed α-Al2O3(0001) surface
    Barth, C
    Reichling, M
    [J]. NATURE, 2001, 414 (6859) : 54 - 57
  • [2] Imaging the surface and the interface atoms of an oxide film on Ag{111} by scanning tunneling microscopy:: Experiment and theory
    Carlisle, CI
    King, DA
    Bocquet, ML
    Cerdá, J
    Sautet, P
    [J]. PHYSICAL REVIEW LETTERS, 2000, 84 (17) : 3899 - 3902
  • [3] Phonons of clean and metal-modified oxide films:: an infrared and HREELS study
    Frank, M
    Wolter, K
    Magg, N
    Heemeier, M
    Kühnemuth, R
    Bäumer, M
    Freund, HJ
    [J]. SURFACE SCIENCE, 2001, 492 (03) : 270 - 284
  • [4] Self-limited growth of a thin oxide layer on Rh(111) -: art. no. 126102
    Gustafson, J
    Mikkelsen, A
    Borg, M
    Lundgren, E
    Köhler, L
    Kresse, G
    Schmid, M
    Varga, P
    Yuhara, J
    Torrelles, X
    Quirós, C
    Andersen, JN
    [J]. PHYSICAL REVIEW LETTERS, 2004, 92 (12) : 126102 - 1
  • [5] Hagen M, 1998, PHILOS MAG A, V77, P447, DOI 10.1080/01418619808223764
  • [6] CO oxidation on Pt(110): Scanning tunneling microscopy inside a high-pressure flow reactor
    Hendriksen, BLM
    Frenken, JWM
    [J]. PHYSICAL REVIEW LETTERS, 2002, 89 (04) : 1 - 046101
  • [7] FORMATION OF A WELL-ORDERED ALUMINUM-OXIDE OVERLAYER BY OXIDATION OF NIA1(110)
    JAEGER, RM
    KUHLENBECK, H
    FREUND, HJ
    WUTTIG, M
    HOFFMANN, W
    FRANCHY, R
    IBACH, H
    [J]. SURFACE SCIENCE, 1991, 259 (03) : 235 - 252
  • [8] Ultrathin aluminum oxide films: Al-sublattice structure and the effect of substrate on ad-metal adhesion
    Jennison, DR
    Bogicevic, A
    [J]. SURFACE SCIENCE, 2000, 464 (2-3) : 108 - 116
  • [9] Atomic structure of antiphase domain boundaries of a thin Al2O3 film on NiAl(110) -: art. no. 256101
    Kulawik, M
    Nilius, N
    Rust, HP
    Freund, HJ
    [J]. PHYSICAL REVIEW LETTERS, 2003, 91 (25)
  • [10] Oxidation of Pt(110) -: art. no. 146104
    Li, WX
    Osterlund, L
    Vestergaard, EK
    Vang, RT
    Matthiesen, J
    Pedersen, TM
    Lægsgaard, E
    Hammer, B
    Besenbacher, F
    [J]. PHYSICAL REVIEW LETTERS, 2004, 93 (14) : 146104 - 1