Improved performance of dye-sensitized solar cells with TiO2/alumina core-shell formation using atomic layer deposition

被引：129

作者：

Ganapathy, V. ^{[1
]}

Karunagaran, B. ^{[1
]}

Rhee, Shi-Woo ^{[1
]}

机构：

[1] Pohang Univ Sci & Technol POSTECH, Dept Chem Engn, Syst Chip Chem Proc Res Ctr, Pohang 790784, South Korea

来源：

JOURNAL OF POWER SOURCES | 2010年 / 195卷 / 15期

关键词：

Atomic layer deposition; Core/shell nanoparticles; TiO2-dye interface; Al2O3-coated TiO2 electrodes; Dye-sensitized solar cells; NANOCRYSTALLINE TIO2; ALUMINUM-OXIDE; THIN-LAYER; NANOPOROUS ELECTRODES; CHARGE RECOMBINATION; EFFICIENCY; IMPEDANCE; AL2O3; FILMS; ENHANCEMENT;

D O I：

10.1016/j.jpowsour.2010.01.085

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Alumina (Al2O3) shell formation on TiO2 core nanoparticles by atomic layer deposition (ALD) is studied to suppress the recombination of charge carriers generated in a dye-sensitized solar cell (DSSC). It is relatively easy to control the shell thickness using the ALD method by controlling the number of cycles. An optimum thickness can be identified, which allows tunneling of the forward current while suppressing recombination. High-resolution TEM measurements show that a uniform Al2O3 shell is formed around the TiO2 core particles and elemental mapping of the porous TiO2 layer reveals that the Al2O3 distribution is uniform throughout the layer. The amount of dye absorption is increased with increase in the shell thickness but electrochemical impedance spectroscopic (EIS) measurement shows a drastic increase in the resistance. With an optimum Al2O3 thickness of 2 nm deposited by ALD, a 35% improvement in the cell efficiency (from 6.2 to 8.4%) is achieved. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：5138 / 5143

页数：6

共 29 条

[21] Morphological and photoelectrochemical characterization of core-shell nanoparticle films for dye-sensitized solar cells:: Zn-O type shell on SnO2 and TiO2 cores [J].