Temporal evolution of relaxation in rubbed polystyrene thin films

被引:11
作者
Tsang, OC [1 ]
Tsui, OKC [1 ]
Yang, Z [1 ]
机构
[1] Hong Kong Univ Sci & Technol, Dept Phys, Kowloon, Hong Kong, Peoples R China
来源
PHYSICAL REVIEW E | 2001年 / 63卷 / 06期
关键词
D O I
10.1103/PhysRevE.63.061603
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Temporal relaxation of rubbed polystyrene (PS) thin films (50 nm thick) was studied by probing the decay of the optical anisotropy in the sample. Our results show that the relaxation process is characterized by two single-exponential decays plus a temperature-dependent constant. Both relaxations are orders of magnitude faster than the main chain (alpha) relaxation at temperatures well below (>10 degreesC) T-g, with activation energies 3.0 kcal/mol and 5.1 kcal/mol, respectively, either of which are much smaller than that of the alpha relaxation (similar to 50 kcal/mol). The decay time constants are found to be independent of the sample molecular weights M-w (=13.7 K to 550 K Daltons. M-w/M-n less than or equal to 1.1) at these temperatures. This shows the local nature of the relaxation modes of rubbed PS.
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页数:4
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