Study of the conductivity of nitrogen doped tetrahedral amorphous carbon films

被引：19

作者：

Liu, Shu

Wang, Guangfu

Wang, Zhenghao ^{[1
]}

机构：

[1] Beijing Normal Univ, Dept Chem, Beijing 100875, Peoples R China

[2] Beijing Normal Univ, Analyt & Testing Ctr, Beijing 100875, Peoples R China

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 2007年 / 353卷 / 29期

基金：

中国国家自然科学基金;

关键词：

amorphous carbon; electrical conductivity; photoconductivity;

D O I：

10.1016/j.jnoncrysol.2007.05.021

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The conductivity of nitrogen incorporated tetrahedral amorphous carbon (taC:N) films prepared by filtered cathodic vacuum arc (FCVA) system was studied. The film resistivity varied as a function of nitrogen content in a wide nitrogen content range from 1 to 23 at.%. An interesting phenomenon of the photoconductivity for the films was found, that the resistivity of those films with low nitrogen content (< 5 at.%) increased due to the light irradiation. This kind of behavior of photoconductivity had not been discussed in previous papers on taC:N films. (c) 2007 Elsevier B.V. All rights reserved.

引用

页码：2796 / 2798

页数：3

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