Effects of ageing on porous silicon photoluminescence: Correlation with FTIR and UV-Vis spectra

被引:30
作者
Butturi, MA
Carotta, MC
Martinelli, G
Passari, L
Youssef, GM
Chiorino, A
Ghiotti, G
机构
[1] AIN SHAMS UNIV,FAC SCI,DEPT PHYS,CAIRO,EGYPT
[2] UNIV TURIN,INORGAN PHYS & MAT CHEM DEPT,I-10125 TURIN,ITALY
关键词
D O I
10.1016/S0038-1098(96)00539-X
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
An analysis about the change of photoluminescence (PL) intensity during ageing in porous silicon (p-Si) at room temperature (RT) is reported. PL measurements have been correlated to Fourier transform infrared spectrometry (FTIR), UV-Vis reflectance spectra (RS) and transmission electron microscopy (TEM) with the aim of clarifying the basic mechanism of the luminescence intensity variation. After six months of ageing we observed a value of the PL intensity approximately 200 times greater than at beginning together with a blue-shift of 50 nm. The FTIR experiments evidenced that an oxygen passivation effect associated to the quantum confinement model allows to justify the observed behaviour under ageing; moreover the absorption edge of about 2 eV determined by the reflectance measurements corresponds to the high energy tail of the PL spectra. TEM images are also in agreement with the shift of the gap and with the wire shrinkage due to the SiO2 layer observed by IR spectra. Copyright (C) 1996 Elsevier Science Ltd.
引用
收藏
页码:11 / 16
页数:6
相关论文
共 26 条
[1]   INFRARED STUDY OF SURFACE MODES ON SILICA [J].
BOCCUZZI, F ;
COLUCCIA, S ;
GHIOTTI, G ;
MORTERRA, C ;
ZECCHINA, A .
JOURNAL OF PHYSICAL CHEMISTRY, 1978, 82 (11) :1298-1303
[2]   SILICON QUANTUM WIRE ARRAY FABRICATION BY ELECTROCHEMICAL AND CHEMICAL DISSOLUTION OF WAFERS [J].
CANHAM, LT .
APPLIED PHYSICS LETTERS, 1990, 57 (10) :1046-1048
[3]   ATMOSPHERIC IMPREGNATION OF POROUS SILICON AT ROOM-TEMPERATURE [J].
CANHAM, LT ;
HOULTON, MR ;
LEONG, WY ;
PICKERING, C ;
KEEN, JM .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (01) :422-431
[4]   CORRELATION OF THE STRUCTURAL AND OPTICAL-PROPERTIES OF LUMINESCENT, HIGHLY OXIDIZED POROUS SILICON [J].
CULLIS, AG ;
CANHAM, LT ;
WILLIAMS, GM ;
SMITH, PW ;
DOSSER, OD .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (01) :493-501
[5]   SILOXENE - CHEMICAL QUANTUM CONFINEMENT DUE TO OXYGEN IN A SILICON MATRIX [J].
DEAK, P ;
ROSENBAUER, M ;
STUTZMANN, M ;
WEBER, J ;
BRANDT, MS .
PHYSICAL REVIEW LETTERS, 1992, 69 (17) :2531-2534
[6]   QUANTUM CONFINEMENT IN SI NANOCRYSTALS [J].
DELLEY, B ;
STEIGMEIER, EF .
PHYSICAL REVIEW B, 1993, 47 (03) :1397-1400
[7]  
DILLON AC, 1993, SURF SCI, V295, pL998, DOI 10.1016/0039-6028(93)90175-J
[8]   FTIR STUDIES OF H2O AND D2O DECOMPOSITION ON POROUS SILICON SURFACES [J].
GUPTA, P ;
DILLON, AC ;
BRACKER, AS ;
GEORGE, SM .
SURFACE SCIENCE, 1991, 245 (03) :360-372
[9]   FOURIER-TRANSFORM IR MONITORING OF POROUS SILICON PASSIVATION DURING POSTTREATMENTS SUCH AS ANODIC-OXIDATION AND CONTACT WITH ORGANIC-SOLVENTS [J].
HORY, MA ;
HERINO, R ;
LIGEON, M ;
MULLER, F ;
GASPARD, F ;
MIHALCESCU, I ;
VIAL, JC .
THIN SOLID FILMS, 1995, 255 (1-2) :200-203
[10]   AGING PHENOMENA OF LIGHT-EMITTING POROUS SILICON [J].
ITO, T ;
HIRAKI, A .
JOURNAL OF LUMINESCENCE, 1993, 57 (1-6) :331-339