Ion beam doping of silicon nanowires

被引:81
作者
Colli, Alan [1 ]
Fasoli, Andrea [2 ]
Ronning, Carsten [3 ]
Pisana, Simone [2 ]
Piscanec, Stefano [2 ]
Ferrari, Andrea C. [2 ]
机构
[1] Nokia Res Ctr Cambridge UK, Nanosci Ctr, Cambridge CB3 0FF, England
[2] Univ Cambridge, Dept Engn, Cambridge CB3 0FA, England
[3] Univ Jena, Inst Solid State Phys, D-07743 Jena, Germany
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1021/nl080610d
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We demonstrate n- and p-type field-effect transistors based on Si nanowires (SiNWs) implanted with P and B at fluences as high as 10(15) cm(-2). Contrary to what would happen in bulk Si for similar fluences, in SiNWs this only induces a limited amount of amorphization and structural disorder, as shown by electrical transport and Raman measurements. We demonstrate that a fully crystalline structure can be recovered by thermal annealing at 800 degrees C. For not-annealed, as-implanted NWs, we correlate the onset of amorphization with an increase of phonon confinement in the NW core. This is ion-dependent and detectable for P-implantation only. Hysteresis is observed following both P and B implantation.
引用
收藏
页码:2188 / 2193
页数:6
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