RAMAN-SCATTERING IN PURE AND HYDROGENATED AMORPHOUS-GERMANIUM AND SILICON

被引:190
作者
BERMEJO, D [1 ]
CARDONA, M [1 ]
机构
[1] MAX PLANCK INST FESTKORPERFORSCH,D-7000 STUTTGART,FED REP GER
关键词
D O I
10.1016/0022-3093(79)90085-1
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The Stokes Raman spectra of pure and hydrogenated amorphous germanium and silicon are discussed. First- and second-order structures due to the vibration of GeGe and SiSi bonds and also first-order structures due to GeH and SiH bonds are observed. The resonance behaviour and the polarization ratio of the observed structures are presented and interpreted in terms of a dielectric constant-bond polarizability model. © 1979.
引用
收藏
页码:405 / 419
页数:15
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