Leakage current characteristics of lead-zirconate-titanate thin film capacitors for memory device applications

被引:35
作者
Chen, HM [1 ]
Tsaur, SW [1 ]
Lee, JYM [1 ]
机构
[1] Tsing Hua Univ, Dept Elect Engn, Hsinchu, Taiwan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1998年 / 37卷 / 07期
关键词
ferroelectric; lead-zirconate-titanate thin film capacitor; leakage current mechanism; electronic conduction current; polarization current; Debye-type electric polarization; ohmic conduction; Poole-Frenkel emission;
D O I
10.1143/JJAP.37.4056
中图分类号
O59 [应用物理学];
学科分类号
摘要
The leakage cut-rent of ferroelectric thin film capacitors is comprised of electronic conduction current and polarization current. In this work, the origin of these leakage current components in lead-zirconate-titanate (PZT) thin film capacitors is studied by means of two different methods. The first method distinguishes the current components by measuring the leakage current with different delay times. The second method determines the current components by measuring the charging and discharging currents when a specified voltage is turned on and off. Both measurements show that the polarization current is dominant in an electric field lower than 100 kV/cm. The polarization current is modeled using Debye-type electric polarization. The relaxation times and equivalent capacitances of the polarization current are extracted from the discharging current. The electronic conduction current obtained by measuring the leakage current with long delay time can be explained to be due to ohmic conduction in a low field (lower than 40 kV/cm) and Poole-Frenkel emission in a high field (higher than 40 kV/cm). The total leakage current calculated by the sum of the polarization current and the electronic conduction current agrees well with the measured result.
引用
收藏
页码:4056 / 4060
页数:5
相关论文
共 24 条
[1]  
ABT N, 1991, INT C SOL STAT DEV M, P189
[2]  
Carrano J., 1989, International Electron Devices Meeting 1989. Technical Digest (Cat. No.89CH2637-7), P255, DOI 10.1109/IEDM.1989.74273
[3]  
CAUUANO J, 1991, IEEE T ULTRASON FERR, V38, P690
[4]   An investigation on the leakage current and time dependent dielectric breakdown of ferroelectric lead-zirconate-titanate thin film capacitors for memory device applications [J].
Chen, JL ;
Chen, HM ;
Lee, JYM .
APPLIED PHYSICS LETTERS, 1996, 69 (26) :4011-4013
[5]   ELECTRODE INFLUENCE ON THE CHARGE-TRANSPORT THROUGH SRTIO3 THIN-FILMS [J].
DIETZ, GW ;
ANTPOHLER, W ;
KLEE, M ;
WASER, R .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (10) :6113-6121
[6]   FATIGUE AND SWITCHING IN FERROELECTRIC MEMORIES - THEORY AND EXPERIMENT [J].
DUIKER, HM ;
BEALE, PD ;
SCOTT, JF ;
DEARAUJO, CAP ;
MELNICK, BM ;
CUCHIARO, JD ;
MCMILLAN, LD .
JOURNAL OF APPLIED PHYSICS, 1990, 68 (11) :5783-5791
[7]  
EATON SS, 1988, P IEEE INT SOL STAT, P130
[8]  
EMETA M, 1973, J AM CERAM SOC, V56, P394
[9]   AN EXPERIMENTAL 512-BIT NONVOLATILE MEMORY WITH FERROELECTRIC STORAGE CELL [J].
EVANS, JT ;
WOMACK, R .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1988, 23 (05) :1171-1175
[10]   CURRENT-VOLTAGE CHARACTERISTICS OF ELECTRON-CYCLOTRON-RESONANCE SPUTTER-DEPOSITED SRTIO3 THIN-FILMS [J].
FUKUDA, Y ;
AOKI, K ;
NUMATA, K ;
NISHIMURA, A .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (9B) :5255-5258