Properties of dc magnetron sputtered indium tin oxide films on polymeric substrates at room temperature

被引:76
作者
Shin, JH [1 ]
Shin, SH [1 ]
Park, JI [1 ]
Kim, HH [1 ]
机构
[1] Doowon Inst Technol, Dept Elect, Ansung 456890, South Korea
关键词
D O I
10.1063/1.1357470
中图分类号
O59 [应用物理学];
学科分类号
摘要
Indium tin oxide (ITO) thin films were deposited on polymeric substrates at room temperature by dc reactive magnetron sputtering from an In-Sn (90-10 wt%) alloy target. The electrical, optical, and mechanical properties of ITO films on various substrates such as polycarbonate, acrylic, polyethylene terephthalate, and glass are influenced sensitively by sputtering parameters. Therefore, the dependence of these properties on dc power, working pressure, and partial oxygen content has been systematically investigated. Low dc power was applied to avoid the deformation of polymeric substrates. The electrical resistivity of as-deposited ITO films decreases initially and then increases as oxygen partial pressure (PO2) increases. The optical transmittance at visible wavelength of 550 nm was as much as 85%. The friction force of as-deposited ITO films on various substrates is increased with an increase of dc power, and behaves similarly to the optimum curve of resistivity with increasing PO2. (C) 2001 American Institute of Physics.
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收藏
页码:5199 / 5203
页数:5
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共 18 条
[1]   Pulsed laser deposition of low-resistivity indium tin oxide thin films at low substrate temperature [J].
Adurodija, FO ;
Izumi, H ;
Ishihara, T ;
Yoshioka, H ;
Matsui, H ;
Motoyama, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (5A) :2710-2716
[2]   Use of the magnetron-sputtering technique for the control of the properties of indium tin oxide thin films [J].
Bhagwat, S ;
Howson, RP .
SURFACE & COATINGS TECHNOLOGY, 1999, 111 (2-3) :163-171
[3]   RF MAGNETRON-SPUTTERED INDIUM TIN OXIDE FILM ON A REACTIVELY ION-ETCHED ACRYLIC SUBSTRATE [J].
CHIOU, BS ;
HSIEH, ST .
THIN SOLID FILMS, 1993, 229 (02) :146-155
[4]   DEPOSITION OF INDIUM TIN OXIDE-FILMS ON ACRYLIC SUBSTRATES BY RADIOFREQUENCY MAGNETRON SPUTTERING [J].
CHIOU, BS ;
HSIEH, ST ;
WU, WF .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1994, 77 (07) :1740-1744
[5]   THE ORIGIN OF THE INHOMOGENEITY OF ELECTRICAL-RESISTIVITY IN MAGNETRON-SPUTTERED INDIUM TIN OXIDE THIN-FILMS [J].
ICHIHARA, K ;
INOUE, N ;
OKUBO, M ;
YASUDA, N .
THIN SOLID FILMS, 1994, 245 (1-2) :152-156
[6]   LOW RESISTIVITY INDIUM TIN OXIDE TRANSPARENT CONDUCTIVE FILMS .2. EFFECT OF SPUTTERING VOLTAGE ON ELECTRICAL PROPERTY OF FILMS [J].
ISHIBASHI, S ;
HIGUCHI, Y ;
OTA, Y ;
NAKAMURA, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03) :1403-1406
[7]   ELECTRICAL AND OPTICAL-PROPERTIES OF INDIUM TIN OXIDE THIN-FILMS DEPOSITED ON UNHEATED SUBSTRATES BY DC REACTIVE SPUTTERING [J].
KARASAWA, T ;
MIYATA, Y .
THIN SOLID FILMS, 1993, 223 (01) :135-139
[8]   CALCULATION OF THE FIGURE OF MERIT FOR INDIUM TIN OXIDE-FILMS BASED ON BASIC THEORY [J].
KNICKERBOCKER, SA ;
KULKARNI, AK .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03) :1048-1052
[9]   LOW-PRESSURE AND TEMPERATURE DEPOSITION OF TRANSPARENT CONDUCTIVE INDIUM TIN OXIDE (ITO) FILMS BY THE FACE TARGET SPUTTERING (FTS) PROCESS [J].
LEE, WK ;
MACHINO, T ;
SUGIHARA, T .
THIN SOLID FILMS, 1993, 224 (01) :105-111
[10]   Study of the effect of the oxygen partial pressure on the properties of rf reactive magnetron sputtered tin-doped indium oxide films [J].
Meng, LJ ;
dos Santos, MP .
APPLIED SURFACE SCIENCE, 1997, 120 (3-4) :243-249