Investigation of the aluminum oxide/Si(100) interface formed by chemical vapor deposition

被引：42

作者：

Chowdhuri, AR ^{[1
]}

Takoudis, CG ^{[1
]}

机构：

[1] Univ Illinois, Dept Chem Engn, Chicago, IL 60607 USA

来源：

THIN SOLID FILMS | 2004年 / 446卷 / 01期

基金：

美国国家科学基金会;

关键词：

aluminum oxide; interface; metal organic chemical vapor deposition; infrared spectroscopy;

D O I：

10.1016/S0040-6090(03)01311-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films of aluminum oxide were deposited using trimethylaluminum and oxygen. The deposition rate was found to decrease with increasing temperature. Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy (XPS) were used to investigate the film/substrate interface. When dryO(2) was used during deposition, the film/substrate interface was free of any silicon dioxide or aluminum silicate phase. On annealing the as-deposited films in Ar, a layer of silicon dioxide film formed at the interface. XPS results indicated that the O/Al ratio in the as-deposited films was higher than that in stoichiometric Al2O3. However, the ratio was found to decrease in the annealed samples suggesting that excess oxygen present in the deposited films is responsible for the formation of interfacial silicon dioxide layer. Interfacial phase formation was observed in the as-deposited samples, when small amounts of ozone along with oxygen were used as the oxygen precursor. (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：155 / 159

页数：5

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