The use of oxygen isotopic labeling to understand oxidation mechanisms

被引:22
作者
Akermark, T [1 ]
机构
[1] Royal Inst Technol, Dept Mat Sci & Engn, Div Corros Sci, S-10044 Stockholm, Sweden
来源
OXIDATION OF METALS | 1998年 / 50卷 / 3-4期
关键词
oxidation kinetics; oxygen exchange; Si; alumina-forming alloys; depth profiling;
D O I
10.1023/A:1018832103466
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
Isotopic labeling is a powerful tool to evaluate transport and reaction mechanisms of oxidation, The evaluation can answer the essential question in high-temperature oxidation, which is the dominating migrating species? Isotopic labeling can be used in two different ways. analysis of the gas phase and analysis of the oxide formed. By using as-reported, depth-profiling data from the literature, the oxygen exchange was evaluated and compared with oxide growth. Gas-phase analysis was used to evaluate the oxygen-exchange reactions, O-2 <----> H2O, O-2 <----> O-2, and O-2 <----> MexOy, in relation to the oxidation of Si and Fe-Cr-Al alloys in similar to 10 mbar isotopically-labeled H2O/O-2-gas mixtures at 900 to 950 degrees C. The time dependence of the rare of the oxygen exchange was used to explain the deviation from parabolic oxidation kinetics. The results of this study suggest that atomic oxygen is the migrating species during the oxidation of Si and alumina-forming alloys.
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页码:167 / 188
页数:22
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