Effect of a magnetic field on electrodeposition - Chronoamperometry of Ag, Cu, Zn, and Bi

The transient current response following a stepwise decrease of potential from the rest potential is studied for solutions of Ag+, Zn2+, Cu2+, and Bi3+, comparing the behavior in the presence and absence of a 0.5 T magnetic field. In all cases, regardless of whether ions are paramagnetic (Cu2+) or diamagnetic (Ag+, Zn2+, Bi3+), the plating current with a field increases in the Iona-time limit when the potential is stepped into the mass-transport-limited region. The results support the Aogaki model of mass-transport enhancement due to disruption of the diffusion layer by the Lorentz force j x B. There is no effect of the magnetic field on the diffusion coefficient D derived from the Cottrell plots. (C) 2001 The Electrochemical Society.