Numerical simulation of grain-boundary grooving by level set method

被引:38
作者
Khenner, M [1 ]
Averbuch, A
Israeli, M
Nathan, M
机构
[1] Tel Aviv Univ, Sch Comp Sci, IL-69978 Tel Aviv, Israel
[2] Technion Israel Inst Technol, Fac Comp Sci, IL-32000 Haifa, Israel
[3] Tel Aviv Univ, Fac Engn, Dept Elect Engn Phys Elect, IL-69978 Tel Aviv, Israel
关键词
D O I
10.1006/jcph.2001.6760
中图分类号
TP39 [计算机的应用];
学科分类号
081203 ; 0835 ;
摘要
A numerical investigation of grain-boundary grooving by means of a level set method is carried out. An idealized polycrystalline interconnect which consists of grains separated by parallel grain boundaries aligned normal to the average orientation of the surface is considered. Initially. the surface diffusion is the only physical mechanism assumed. The surface diffusion is driven by surface-curvature gradients. while a tired surface slope and zero atomic flux are assumed at the groove root. The corresponding mathematical system is an initial boundary value problem For a two-dimensional equation of Hamilton-Jacobi type. The results obtained are in good agreement with both Mullins analytical "small-slope" solution of the linearized problem (W. W. Mullins. 1957. J. Appl. Phys. 28. 333) (for the case of an isolated grain boundary) and with the solution for a periodic array of grain boundaries (S. A. Hackney, 1988. Scripta Metall. 22. 1731). Incorporation of an electric field changes the problem to one of electromigration. Preliminary results of electromigration drift velocity simulations in copper lines art: presented and discussed. (C) 2001 Academic Press.
引用
收藏
页码:764 / 784
页数:21
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