Preparation of metal (W, Mo, Nb, Ti) containing a-C:H films by reactive magnetron sputtering

We discuss the preparation of metal containing hydrogenated amorphous carbon (a-C:H) thin films by means of reactive magnetron sputtering with pulsed d.c. power of a metal target (W, Mo, Nb, Ti) and r.f. bias using different gas mixtures of methane and argon. The obtained samples comprised a thickness between 100 and 600 nm and a low internal stress when little quantities of metal were incorporated. The chemical composition was analysed by X-ray Photoelectron Spectroscopy (XPS). Depth profile composition was qualitatively displayed by secondary ion mass spectrometry (SIMS). The optical characterization of the films was carried out by transmittance measurements in the visible range and showed a relationship between the optical band gap and the composition. Structural information was obtained by X-ray diffraction (XRD), whose results showed a shift of the Bragg peaks from carbide crystallites as the metal amount increased. Peak width calculations situated particle sizes in the nanometric range. Surface topography from atomic force microscopy (AFM) measurements is also discussed. Surface energy was measured by the contact angle technique. The internal stress of the films was obtained by profilometry and a relationship with their structure was found. The results are compared with those corresponding to metal-free (pure) a-C:H films. (C) 2003 Elsevier B.V. All rights reserved.