Low-temperature atomic layer deposition of Al2O3 thin coatings for corrosion protection of steel: Surface and electrochemical analysis

被引：206

作者：

Diaz, Belen ^{[1
]}

Harkonen, Emma ^{[2
]}

Swiatowska, Jolanta ^{[1
]}

Maurice, Vincent ^{[1
]}

Seyeux, Antoine ^{[1
]}

Marcus, Philippe ^{[1
]}

Ritala, Mikko ^{[2
]}

机构：

[1] Chim ParisTech ENSCP, Lab Physicochim Surfaces, CNRS, UMR 7045, F-75005 Paris, France

[2] Univ Helsinki, Inorgan Chem Lab, FIN-00014 Helsinki, Finland

来源：

CORROSION SCIENCE | 2011年 / 53卷 / 06期

关键词：

Steel; EIS; XPS; SIMS; Oxide coatings; ALUMINUM-OXIDE FILMS; STAINLESS-STEEL; COATED STEELS; XPS SPECTRA; BEHAVIOR; RESISTANCE; ELECTRODE; IRON; TIN; SPECTROSCOPY;

D O I：

10.1016/j.corsci.2011.02.036

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

ToF-SIMS, XPS, voltammetry and EIS investigation of the anti-corrosion properties of thin (10, 50 and 100 nm) alumina coatings grown by atomic layer deposition at 160 degrees C on steel is reported. Surface analysis shows a thickness-independent Al2O3 stoichiometry of the coating and trace contamination by the growth precursors. The buried coating/alloy interface has iron oxide formed in ambient air and/or resulting from the growth of spurious traces in the initial stages of deposition. Electrochemical analysis yields an exponential decay of the coating porosity over four orders of magnitude with increasing thickness, achieved by sealing of the more defective first deposited 10 nm. (C) 2011 Elsevier Ltd. All rights reserved.

引用

页码：2168 / 2175

页数：8

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