Electrical properties of the stacked ZnS/photo-enhanced native oxide passivation for long wavelength HgCdTe photodiodes

被引:20
作者
Lin, CT [1 ]
Su, YK [1 ]
Huang, ET [1 ]
Chang, SJ [1 ]
Chen, GS [1 ]
Sun, TP [1 ]
Luo, JJ [1 ]
机构
[1] CHUNG SHAN INST SCI & TECHNOL,LUNGTAN,TAIWAN
关键词
D O I
10.1109/68.491592
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new surface treatment ZnS/photo-enhanced native oxide, is passivation, The photo native oxide layer was deposited by direct photo chemical vapor deposition (DPCVD) using a deuterium (D-2) lamp as the optical source, By using this method, we found that there is no accumulation of Hg in the oxide/HgCdTe interface regions, Since the photo chemical vapor native oxidation is a dry oxidation method deposited at a low temperature, it can effectively suppress the Hg enhancement and the Cd depletion effects and thus obtain a high quality interface. The electrical properties of a Au-ZnS/photo-enhanced native oxide/HgCdTe metal-insulator-semiconductor (MIS) diodes were characterized by capacitance-voltage (C-V) measurement. It was found that the flat band voltage of such a MIS diode is close to 0.2 V with an effective fixed oxide charge lower than 1 x 10(10) cm(-2).
引用
收藏
页码:676 / 678
页数:3
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