Mechanisms for O2 dissociation during pulsed-laser ablation and deposition

被引：26

作者：

Camposeo, A ^{[1
]}

Cervelli, F ^{[1
]}

Fuso, F ^{[1
]}

Allegrini, M ^{[1
]}

Arimondo, E ^{[1
]}

机构：

[1] Univ Pisa, Dipartimento Fis, Ist Nazl Fis Mat, I-56127 Pisa, Italy

来源：

APPLIED PHYSICS LETTERS | 2001年 / 78卷 / 16期

关键词：

D O I：

10.1063/1.1366363

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We investigate different dissociation mechanisms for O-2 gas during pulsed-laser ablation and deposition. Mesaurements are carried out by using an in situ diagnostics based on absorption spectroscopy of oxygen gas, with space- and time-resolved capabilities, during laser ablation of a metal alloy target in the presence of an oxygen environment. Data, analyzed as a function of ablation parameters, indicate that two different mechanisms, involving electron collisions and formation of a high-density, high-temperature shock layer, play an important role in producing atomic oxygen which can subsequently react with the ablated species. (C) 2001 American Institute of Physics.

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页码：2402 / 2404

页数：3

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