Entangled-state lithography:: Tailoring any pattern with a single state

被引：92

作者：

Björk, G

Sánchez-Soto, LL

Söderholm, J

机构：

[1] Univ Complutense, Fac Ciencias Fis, Dept Opt, E-28040 Madrid, Spain

[2] Royal Inst Technol, KTH, Dept Elect, SE-16440 Kista, Sweden

来源：

PHYSICAL REVIEW LETTERS | 2001年 / 86卷 / 20期

关键词：

D O I：

10.1103/PhysRevLett.86.4516

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We demonstrate a systematic approach to Heisenberg-Limited lithographic image formation using four-mode reciprocal binomial states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a (N + 1) X (N + 1) grid, occupying a square with the side half a wavelength long, can be generated from a 2N-photon state.

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页码：4516 / 4519

页数：4

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