Evaluation of performance capabilities of emitters and detectors based on a common MQW structure

被引:2
作者
Cengher, D
Aperathitis, E
Androulidaki, M
Deligeorgis, G
Kayambaki, M
Hatzopoulos, Z
Tzanetakis, P
Georgakilas, A
机构
[1] Fdn Res & Technol HELLAS, Inst Elect Struct & Laser, Heraklion 71110, Crete, Greece
[2] Univ Crete, Dept Phys, Heraklion, Crete, Greece
[3] Natl Inst Mat Phys, Bucharest 76900, Romania
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2001年 / 80卷 / 1-3期
关键词
semiconductor laser; photodetectors; GaAs/AlGaAs; integration; optoelectronic circuits; photonic integrated circuits;
D O I
10.1016/S0921-5107(00)00614-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Photodetectors (PDs) based on three separate confinement-multiple quantum well (SCH-MQW) structures (with 2, 4 and 8 QWs) and sis graded-index (GRIN) SCH-MQW structures were studied for two types of devices: guided wave and non-guided wave devices. Non-guided wave devices were processed and the capacitance and the responsivity, in the wavelength range of 750-990 nm, were determined for various bias voltages. Guided wave PDs were simulated using the transfer matrix method for optical mode calculation and the minimum length of the detectors was calculated for absorbing 99% of the incident light. The junction capacitance of the guided wave PDs was calculated from the measured capacitance of non-guided wave devices and the minimum size of the devices, values of 215, 101, and 52 fF were obtained for 2, 4 and 8 QW SCH-MQW structures. Laser diodes were also fabricated from the three different SCH-MQW structures. Threshold current densities (J(th)) of 737. 755 and 1210 A cm(-2) were measured for 2, 4 and 8 QWs, respectively. Further improvement was achieved using GRINSCH-MQW structures and LDs with 4 QWs exhibited 33% decrease in J(th) and 22% increase in slope efficiency. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:241 / 244
页数:4
相关论文
共 6 条
[1]   MULTILAYER WAVE-GUIDES - EFFICIENT NUMERICAL-ANALYSIS OF GENERAL STRUCTURES [J].
ANEMOGIANNIS, E ;
GLYTSIS, EN .
JOURNAL OF LIGHTWAVE TECHNOLOGY, 1992, 10 (10) :1344-1351
[2]   GAAS ALGAAS PHOTONIC INTEGRATED-CIRCUITS FABRICATED USING CHEMICALLY ASSISTED ION-BEAM ETCHING [J].
GRANDE, WJ ;
JOHNSON, JE ;
TANG, CL .
APPLIED PHYSICS LETTERS, 1990, 57 (24) :2537-2539
[3]   Scaling optoelectronic-VLSI circuits into the 21st century: A technology roadmap [J].
Krishnamoorthy, AV ;
Miller, DAB .
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 1996, 2 (01) :55-76
[4]  
SINGH J, 1993, PHYSICS SEMICONDUCTO
[5]   LOW-TEMPERATURE WAFER DIRECT BONDING [J].
TONG, QY ;
CHA, GH ;
GAFITEANU, R ;
GOSELE, U .
JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, 1994, 3 (01) :29-35
[6]  
WEISBUCH C, 1991, QUNATUM SEMICONDUCTO