Influence of substrate nature on the microstructure of LPCVD silicon films

被引：4

作者：

Caussat, B

Couderc, JP

Scheid, E

Bourgerette, C

de Mauduit, B

机构：

[1] CNRS, UMR 5503, Lab Genie Chim, F-31078 Toulouse, France

[2] Automat & Anal Syst Lab, CNRS, UPR 8001, F-31077 Toulouse, France

[3] Ctr Elaborat Mat & Etud Struct, CNRS, UPR 8011, F-31055 Toulouse, France

来源：

JOURNAL OF MATERIALS SCIENCE LETTERS | 1998年 / 17卷 / 22期

关键词：

D O I：

10.1023/A:1006696007150

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

页码：1899 / 1901

页数：3

共 8 条

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[6] EXPERIMENTAL AND THEORETICAL-STUDY OF THE CRYSTALLIZATION OF CHEMICAL-VAPOR-DEPOSITED MIXED-PHASE SILICON FILMS [J].

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[7]

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[8] HEAT-CONDUCTION IN SILICON THIN-FILMS - EFFECT OF MICROSTRUCTURE [J].

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