O2 erosion of graphite tile substrates

被引：15

作者：

Davis, JW ^{[1
]}

Hamilton, CG ^{[1
]}

Haasz, AA ^{[1
]}

机构：

[1] Univ Toronto, Inst Aerosp Studies, Fus Res Grp, Toronto, ON M3H 5T6, Canada

来源：

JOURNAL OF NUCLEAR MATERIALS | 2001年 / 288卷 / 2-3期

基金：

加拿大自然科学与工程研究理事会;

关键词：

D O I：

10.1016/S0022-3115(00)00715-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The removal of codeposited tritiated carbon films from the next generation of fusion reactors may rely on the use of baking in an Oz environment to remove the films. In the present study, we have investigated the effect of baking in O-2 on graphite tile substrate materials. After baking five types of graphite in 2.1 kPa O-2 for 100 h at 623 K, no change in mass was observed. An upper limit on the erosion rate was calculated to be similar to4 X 10(-10) C/O-2, whereas the codeposited films obtained from tokamaks have erosion rates as high as 10(-5) C/O-2. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：148 / 152

页数：5

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