GaInN quantum wells grown on facets of selectively grown GaN stripes -: art. no. 182111

被引:60
作者
Neubert, B [1 ]
Brückner, P
Habel, F
Scholz, F
Riemann, T
Christen, J
Beer, M
Zweck, J
机构
[1] Univ Ulm, Optoelect Dept, D-89081 Ulm, Germany
[2] Univ Magdeburg, D-39106 Magdeburg, Germany
[3] Univ Regensburg, D-93040 Regensburg, Germany
关键词
D O I
10.1063/1.2126798
中图分类号
O59 [应用物理学];
学科分类号
摘要
Multiple GaInN quantum wells (QWs) were grown on facets with reduced piezoelectric fields (PFs) of selectively grown GaN stripes oriented along the [1 (1) over bar 00] and [11 (2) over bar0] directions by metalorganic vapor phase epitaxy. We found a higher normalized growth rate for the GaInN QWs on the {1 (1) over bar 01} facets compared to the {11 (2) over bar2} facets and the planar grown reference sample on unstructured template. The different luminescence wavelengths observed for the QWs on these different facets can partly be explained by the reduced PFs, but additionally indicate that the In incorporation efficiency depends on the facet type. On stripes with trapezoidal cross section, we found strong interfacet migration of In and Ga changing the local thickness and composition significantly. (C) 2005 American Institute of Physics.
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页码:1 / 3
页数:3
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