Visualization of active surface molecular motion in polystyrene film by scanning viscoelasticity microscopy

被引：49

作者：

Tanaka, K

Hashimoto, K

Kajiyama, T ^{[1
]}

Takahara, A

机构：

[1] Kyushu Univ, Fac Engn, Dept Appl Chem, Fukuoka 8128581, Japan

[2] Kyushu Univ, Inst Mat Chem & Engn, Fukuoka 8128581, Japan

来源：

LANGMUIR | 2003年 / 19卷 / 17期

关键词：

D O I：

10.1021/la034542g

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A monodisperse polystyrene (PS) film was spin-coated on a silicon wafer with native oxide layer and was in part scratched by a blade. Then, the surface modulus on a given area, in which PS and bared silicon were present, was two-dimensionally mapped as a function of temperature by scanning viscoelasticity microscopy. We visually present evidence that the PS surface started to soften up at a temperature much lower than the bulk glass transition temperature.

引用

收藏

页码：6573 / 6575

页数：3

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