Characterization of Ti1-xAlxN coatings with selective IR reflectivity

被引：23

作者：

Godinho, V. ^{[1
,2
]}

Philippon, D. ^{[1
]}

Rojas, T. C. ^{[1
]}

Novikova, N. N. ^{[3
]}

Yakovlev, V. A. ^{[3
]}

Vinogradov, E. A. ^{[3
]}

Fernandez, A. ^{[1
]}

机构：

[1] CSIC US, Inst Ciencia Mat Sevilla, Seville 41092, Spain

[2] Univ Libre Bruxelles, Chem & Mat Dept, Fac Sci Appl, B-1050 Brussels, Belgium

[3] Russian Acad Sci, Inst Spect, Troitsk 142190, Moscow Reg, Russia

来源：

SOLAR ENERGY | 2010年 / 84卷 / 08期

关键词：

Selective IR; Ti1-xAlxN coatings; Magnetron sputtering; Space applications; Solar absorbers; NITRIDE;

D O I：

10.1016/j.solener.2010.04.021

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

Ti1-xAlxN thin films were deposited by reactive magnetron sputtering. The obtained different stoichiometries give rise to different optical properties as the films change from metallic to dielectric. In this work the IR reflectivity of these coatings is investigated taking into account different application fields for IR selective Ti1-xAlxN thin films. Low Al content coatings present high reflectivity, high absorptance and low thermal emittance. High Al compositions give raise to coatings with high absorptance and high thermal emittance. The composition of the coatings was evaluated combining electron energy loss spectroscopy (EELS) and energy dispersive spectroscopy. Scanning electron microscopy (SEM) revealed a columnar structure. Reflectance spectra for the visible and infrared spectral ranges were used to obtain the solar absorptance and thermal emittance values, used to calculate the equilibrium temperature of the coatings. The thermal stability in air from 300 to 600 degrees C was also evaluated. (C) 2010 Elsevier Ltd. All rights reserved.

引用

页码：1397 / 1401

页数：5

共 14 条

[1] TiAlN/TiAlON/Si3N4 tandem absorber for high temperature solar selective applications [J].

Barshilia, Harish C. ;

Selvakumar, N. ;

Rajam, K. S. ;

Rao, D. V. Sridhara ;

Muraleedharan, K. ;

Biswas, A. .

APPLIED PHYSICS LETTERS, 2006, 89 (19)

[2] Effect of film ion bombardment during the pvd process on the mechanical properties and cutting performance of TiAlN coated tools [J].

Bouzakis, K. -D. ;

Skordaris, G. ;

Michailidis, N. ;

Mirisidis, I. ;

Erkens, G. ;

Cremer, R. .

SURFACE & COATINGS TECHNOLOGY, 2007, 202 (4-7) :826-830

[3] Titanium-aluminum-nitride coatings for satellite temperature control [J].

Brogren, M ;

Harding, GL ;

Karmhag, R ;

Ribbing, CG ;

Niklasson, GA ;

Stenmark, L .

THIN SOLID FILMS, 2000, 370 (1-2) :268-277

[4] Work function and thermal stability of Ti1-xAlxNy for dual metal gate electrodes [J].

Cha, TH ;

Park, DG ;

Kim, TK ;

Jang, SA ;

Yeo, IS ;

Roh, JS ;

Park, JW .

APPLIED PHYSICS LETTERS, 2002, 81 (22) :4192-4194

[5] Characterization and temperature controlling property of TiAlN coatings deposited by reactive magnetron co-sputtering [J].

Chen, J. T. ;

Wang, J. ;

Zhang, F. ;

Zhang, G. A. ;

Fan, X. Y. ;

Wu, Z. G. ;

Yan, P. X. .

JOURNAL OF ALLOYS AND COMPOUNDS, 2009, 472 (1-2) :91-96

[6]

DUFFLE JA, 1980, SOLAR ENERGY THERMAL, P185

[7] Infrared reflectance of direct current magnetron sputter deposited films of Ni93V7, Cu89Ni10Fe1(Mn) and Cu [J].

Gelin, K ;

Boström, I ;

Wäckelgård, E .

THIN SOLID FILMS, 2003, 437 (1-2) :25-33

[8]

IKEDA T, 1991, THIN SOLID FILMS, V195, P99, DOI 10.1016/0040-6090(91)90262-V

[9] Conditions required for achieving superhardness of ≥45 GPa in nc-TiN/a-Si3N4 nanocomposites [J].

Procházka, J ;

Karvánková, P ;

Veprek-Heijman, MGJ ;

Veprek, S .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2004, 384 (1-2) :102-116

[10] Structural and optical properties of titanium aluminum nitride films (Ti1-xAlxN) [J].

Schüler, A ;

Thommen, V ;

Reimann, P ;

Oelhafen, P ;

Francz, G ;

Zehnder, T ;

Düggelin, M ;

Mathys, D ;

Guggenheim, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (03) :922-929

← 1 2 →