Characterization of Ti1-xAlxN coatings with selective IR reflectivity

被引：23

作者：

Godinho, V. ^{[1
,2
]}

Philippon, D. ^{[1
]}

Rojas, T. C. ^{[1
]}

Novikova, N. N. ^{[3
]}

Yakovlev, V. A. ^{[3
]}

Vinogradov, E. A. ^{[3
]}

Fernandez, A. ^{[1
]}

机构：

[1] CSIC US, Inst Ciencia Mat Sevilla, Seville 41092, Spain

[2] Univ Libre Bruxelles, Chem & Mat Dept, Fac Sci Appl, B-1050 Brussels, Belgium

[3] Russian Acad Sci, Inst Spect, Troitsk 142190, Moscow Reg, Russia

来源：

SOLAR ENERGY | 2010年 / 84卷 / 08期

关键词：

Selective IR; Ti1-xAlxN coatings; Magnetron sputtering; Space applications; Solar absorbers; NITRIDE;

D O I：

10.1016/j.solener.2010.04.021

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

Ti1-xAlxN thin films were deposited by reactive magnetron sputtering. The obtained different stoichiometries give rise to different optical properties as the films change from metallic to dielectric. In this work the IR reflectivity of these coatings is investigated taking into account different application fields for IR selective Ti1-xAlxN thin films. Low Al content coatings present high reflectivity, high absorptance and low thermal emittance. High Al compositions give raise to coatings with high absorptance and high thermal emittance. The composition of the coatings was evaluated combining electron energy loss spectroscopy (EELS) and energy dispersive spectroscopy. Scanning electron microscopy (SEM) revealed a columnar structure. Reflectance spectra for the visible and infrared spectral ranges were used to obtain the solar absorptance and thermal emittance values, used to calculate the equilibrium temperature of the coatings. The thermal stability in air from 300 to 600 degrees C was also evaluated. (C) 2010 Elsevier Ltd. All rights reserved.

引用

页码：1397 / 1401

页数：5

共 14 条

[11] The tension of metallic films deposited by electrolysis [J].

Stoney, GG .

PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-CONTAINING PAPERS OF A MATHEMATICAL AND PHYSICAL CHARACTER, 1909, 82 (553) :172-175

[12] HIGH-RATE THICK-FILM GROWTH [J].

THORNTON, JA .

ANNUAL REVIEW OF MATERIALS SCIENCE, 1977, 7 :239-260

[13] Thermal oxidation properties of titanium nitride and titanium-aluminum nitride materials - A perspective for high temperature air-stable solar selective absorber applications [J].

Yin, Y. ;

Hang, L. ;

Zhang, S. ;

Bui, X. L. .

THIN SOLID FILMS, 2007, 515 (05) :2829-2832

[14] Phase transition and properties of Ti-Al-N thin films prepared by rf-plasma assisted magnetron sputtering [J].

Zhou, M ;

Makino, Y ;

Nose, M ;

Nogi, K .

THIN SOLID FILMS, 1999, 339 (1-2) :203-208

← 1 2 →