Two-photon diffraction and quantum lithography

被引：525

作者：

D'Angelo, M

Chekhova, MV ^{[1
]}

Shih, Y

机构：

[1] Univ Maryland Baltimore Cty, Dept Phys, Baltimore, MD 21250 USA

[2] Moscow MV Lomonosov State Univ, Dept Phys, Moscow, Russia

来源：

PHYSICAL REVIEW LETTERS | 2001年 / 87卷 / 01期

关键词：

D O I：

10.1103/PhysRevLett.87.013602

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We report a proof-of-principle experimental demonstration of quantum lithography. Utilizing the entangled nature of a two-photon state, the experimental results have beaten the classical diffraction limit by a factor of 2. This is a quantum mechanical two-photon phenomenon but not a violation of the uncertainty principle.

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页数：4

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