In situ characterization of atomic layer deposition of SrTiO3

被引：23

作者：

Rahtu, A ^{[1
]}

Hänninen, T ^{[1
]}

Ritala, M ^{[1
]}

机构：

[1] Univ Helsinki, Dept Chem, Helsinki 00014, Finland

来源：

JOURNAL DE PHYSIQUE IV | 2001年 / 11卷 / PR3期

关键词：

D O I：

10.1051/jp4:20013115

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The reaction mechanisms in the atomic layer deposition of SrO and SrTiO3 Were studied with a quartz crystal microbalance and a quadrupole mass spectrometer at 325 degreesC. The precursors were Sr((C5Pr3H2)-Pr-i)(2), Ti(OCH(CH3)(2))(4) and deuterated water. The main gaseous byproduct was (C5Pr3H2D)-Pr-i. When SrO was grown on TiO2, the TiO2 surface affected the growth until it became covered with SrO. By contrast, the SrO surface did not have as significant effect to the growth of TiO2.

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页码：923 / 930

页数：8

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