Ultrashort electron bunches generated with high-intensity lasers: Applications to injectors and x-ray sources

被引:27
作者
Fritzler, S [1 ]
Ta Phuoc, K
Malka, V
Rousse, A
Lefebvre, E
机构
[1] Ecole Polytech, Lab Opt Appl, ENSTA, UMR 7639,CNRS, F-91761 Palaiseau, France
[2] CEA DAM, Dept Phys Theor & Appl, F-91680 Bruyeres Le Chatel, France
关键词
D O I
10.1063/1.1626016
中图分类号
O59 [应用物理学];
学科分类号
摘要
The efficiency of the "forced laser wakefield" regime has recently been demonstrated, with the acceleration of electrons up to 200 MeV with a short pulse, 10 Hz laser [V. Malka , Science 298, 1596 (2002)]. Numerical simulations presented in this letter provide strong indications that the resulting electron bunches also have very short durations, less than 100 fs. All these features combine to suggest a number of interesting applications for such a source. We discuss its use as a high-energy injector for conventional accelerators, and assess the characteristics of the x-ray pulses that could be obtained via the channelling effect or Thomson scattering with this electron pulse. (C) 2003 American Institute of Physics.
引用
收藏
页码:3888 / 3890
页数:3
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