Gas chromatographic analysis of trace gas impurities in tungsten hexafluoride

被引：25

作者：

Laurens, JB

de Coning, JP

Swinley, JM

机构：

[1] Univ Pretoria, Dept Chem Pathol, ZA-0001 Pretoria, South Africa

[2] S African Nucl Energy Corp, Pretoria, South Africa

[3] Sci Grp Pty Ltd, Johannesburg, South Africa

来源：

JOURNAL OF CHROMATOGRAPHY A | 2001年 / 911卷 / 01期

关键词：

pulsed discharge helium ionisation detection; detection; GC; gases; tungsten hexafluoride; oxygen; nitrogen; carbon monoxide; carbon dioxide; sulfur hexafluoride;

D O I：

10.1016/S0021-9673(00)01253-X

中图分类号：

Q5 [生物化学];

学科分类号：

071010 ; 081704 ;

摘要：

Highly reactive fluorinated gaseous matrices require special equipment and techniques for the gas chromatographic analysis of trace impurities in these gases. The impurities that were analysed at the low-mug/l levels included oxygen, nitrogen, carbon dioxide, carbon monoxide, sulfur hexafluoride and hydrogen. This paper describes the use of a system utilising backflush column switching to protect the columns and detectors in the analysis of trace gas impurities in tungsten hexafluoride. Two separate channels were used for the analysis of H-2, O-2, N-2, CO, CO2 and SF6 impurities with pulsed discharge helium ionisation detection. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：107 / 112

页数：6