Computer-controlled fabrication of ultra-sharp tungsten tips

被引:17
作者
Kim, YG [1 ]
Choi, EH [1 ]
Kang, SO [1 ]
Cho, G [1 ]
机构
[1] Kwangwoon Univ, Dept Electrophys, Charged Particle Beam & Plasma Lab, Seoul 139701, South Korea
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1998年 / 16卷 / 04期
关键词
D O I
10.1116/1.590130
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In order to monitor the end-point current during electrochemical etching, an analog to digital converter circuit aided by a personal computer has been setup. At the moment the lower part of the needle drops off during the etching process, a maximum current change across the reference resistor is detected by the PC interface card and the applied voltage is then cut off within a few milliseconds. Using these circuits to control the etching time, our experiment has been able to fabricate an ultra-sharp tip of similar to 200 Angstrom radius with a higher reproduction rate and reliability than the conventional method. (C) 1998 American Vacuum Society.
引用
收藏
页码:2079 / 2081
页数:3
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