The production and properties of TiN-Ni nanostructure films by filtered vacuum arc deposition

被引：16

作者：

Irie, M ^{[1
]}

Ohara, H ^{[1
]}

Tsujioka, M ^{[1
]}

Nomura, T ^{[1
]}

机构：

[1] Sumitomo Elect Ind Ltd, Itami Labs, Itami, Hyogo 664, Japan

来源：

MATERIALS CHEMISTRY AND PHYSICS | 1998年 / 54卷 / 1-3期

关键词：

titanium nitride; nanostructure films; filtered vacuum arc source;

D O I：

10.1016/S0254-0584(98)00111-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nanostructure films, consisting of TiN and Ni, were obtained by filtered vacuum are deposition. The TiN-Ni nanostructure film is expected to have superior mechanical properties. In this method, Ti metal ions and Ni metal ions were alternately introduced to the substrate along a magnetic field sustained in the quarter-torus. The nanoparticle structure and the multilayer structure could be obtained. The TED pattern indicated that the crystallographic orientations of TiN and Ni were aligned, TiN (111)//Ni (111), TiN (100)//Ni (100). The thermal stability of the nanostructure and the film hardness were investigated up to 1053 K. It was confirmed that the nanostructure and the film hardness were stable up to 973 K. The nanostructure was effective for improvement of hardness. (C) 1998 Elsevier Science S.A. All rights reserved.

引用

页码：317 / 320

页数：4

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