Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge

被引:134
作者
Gudmundsson, JT
Alami, J
Helmersson, U
机构
[1] Univ Iceland, Inst Sci, IS-107 Reykjavik, Iceland
[2] Linkoping Univ, Dept Phys, SE-58183 Linkoping, Sweden
关键词
D O I
10.1063/1.1376150
中图分类号
O59 [应用物理学];
学科分类号
摘要
We demonstrate the creation of high-density plasma in a pulsed magnetron discharge. A 2.4 MW pulse, 100 mus wide, with a repetition frequency of 50 Hz is applied to a planar magnetron discharge to study the temporal behavior of the plasma parameters: the electron energy distribution function, the electron density, and the average electron energy. The electron density in the vicinity of the substrate, 20 cm below the cathode target, peaks at 8x10(17) m(-3), 127 mus after initiating the pulse. Towards the end of the pulse two energy groups of electrons are present with a corresponding peak in average electron energy. With the disapperance of the high-energy electron group, the electron density peaks, and the electron energy distribution appears to be Maxwellian like. Following the electron density peak, the plasma becomes more Druyvesteyn like with a higher average electron energy. (C) 2001 American Institute of Physics.
引用
收藏
页码:3427 / 3429
页数:3
相关论文
共 11 条
[1]   The Low Arc Volt [J].
Druyvesteyn, M. J. .
ZEITSCHRIFT FUR PHYSIK, 1930, 64 (11-12) :781-798
[2]  
GODYAK VA, 1990, NATO ADV SCI I E-APP, V176, P95
[3]  
Gudmundsson J. T., 1997, M9738 UCBERL
[4]  
HELMERSSON U, 2000, 3 INT EUR ADV SEM DE, P191
[5]   ELECTRON-ENERGY DISTRIBUTION FUNCTION IN A DC MAGNETRON SPUTTERING DISCHARGE [J].
IVANOV, I ;
STATEV, S ;
ORLINOV, V ;
SHKEVOV, R .
VACUUM, 1992, 43 (08) :837-842
[6]   A novel pulsed magnetron sputter technique utilizing very high target power densities [J].
Kouznetsov, V ;
Macák, K ;
Schneider, JM ;
Helmersson, U ;
Petrov, I .
SURFACE & COATINGS TECHNOLOGY, 1999, 122 (2-3) :290-293
[7]  
Lieberman M. A., 1994, PRINCIPLES PLASMA DI
[8]   Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge [J].
Macák, K ;
Kouznetsov, V ;
Schneider, J ;
Helmersson, U ;
Petrov, I .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (04) :1533-1537
[9]   An experimental study of plasma density determination by a cylindrical Langmuir probe at different pressures and magnetic fields in a cylindrical magnetron discharge in heavy rare gases [J].
Passoth, E ;
Kudrna, P ;
Csambal, C ;
Behnke, JF ;
Tichy, M ;
Helbig, V .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1997, 30 (12) :1763-1777
[10]   Electron velocity distribution functions in a sputtering magnetron discharge for the ExB direction [J].
Sheridan, TE ;
Goeckner, MJ ;
Goree, J .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (04) :2173-2176