Autocatalytic water dissociation on Cu(110) at near ambient conditions

被引：125

作者：

Andersson, Klas ^{[1
,2
]}

Ketteler, Guido ^{[3
]}

Bluhm, Hendrik ^{[5
]}

Yamamoto, Susumu ^{[1
]}

Ogasawara, Hirohito ^{[1
]}

Pettersson, Lars G. M. ^{[2
]}

Salmeron, Miquel ^{[3
,4
]}

Nilsson, Anders ^{[1
,2
]}

机构：

[1] Stanford Synchrotron Radiat Lab, Canoga Pk, CA 91309 USA

[2] Stockholm Univ, FYSIKUM, AlbaNova Univ Ctr, SE-10691 Stockholm, Sweden

[3] Lawrence Berkeley Natl Lab, Div Mat Sci, Berkeley, CA 94720 USA

[4] Univ Calif Berkeley, Mat Sci & Engn Dept, Berkeley, CA 94720 USA

[5] Lawrence Berkeley Natl Lab, Div Chem Sci, Berkeley, CA 94720 USA

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2008年 / 130卷 / 09期

关键词：

D O I：

10.1021/ja073727x

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated on the basis of X-ray photoelectron spectroscopy studies carried out in situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275-520 K). The autocatalytic reaction is explained as the result of the strong hydrogen-bond in the H2O-OH complex of the dissociated final state, which lowers the water dissociation barrier according to the Bronsted-Evans-Polanyi relations. A simple chemical bonding picture is presented which predicts autocatalytic water dissociation to be a general phenomenon on metal surfaces.

引用

页码：2793 / 2797

页数：5

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