Soft landing of ions onto self-assembled hydrocarbon and fluorocarbon monolayer surfaces

被引:35
作者
Shen, JW [1 ]
Yim, YH [1 ]
Feng, BB [1 ]
Grill, V [1 ]
Evans, C [1 ]
Cooks, RG [1 ]
机构
[1] Purdue Univ, Dept Chem, W Lafayette, IN 47907 USA
关键词
soft landing; ion deposition; self-assembled monolayers; energy deposition; surface-induced dissociation;
D O I
10.1016/S1387-3806(98)14251-3
中图分类号
O64 [物理化学(理论化学)、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号
070203 ; 070304 ; 081704 ; 1406 ;
摘要
Low energy (less than or equal to 10 eV) ion beams can be soft landed onto a C-12-hydrocarbon self-assembled monolayer (H-SAM) surface. The H-SAM surface causes much less collateral fragmentation of the deposited ions under the same conditions than the corresponding fluorinated self-assembled monolayer (F-SAM) surface. The energy dependence for release of ions deposited onto an F-SAM monolayer surface shows that smaller ions are ejected more readily than sterically bulky species. The threshold energy for release of the soft-landed species by Xe+. coincides with that of the typical chemical sputtering product CF3+ implying that the deposited species are strongly held inside the SAM matrix and that C-C bond cleavage assists in efficient release of the trapped ions. In cases where fragment ions of the deposited projectile are released from the surface, it is shown, by varying the energy and nature of the releasing projectile ion, that dissociation primarily occurs upon impact of the soft-landed ion and not upon its release. Examination of various odd- and even-electron ions confirms the earlier conclusion that the former are efficiently neutralized and only the latter can be soft landed as ions onto F-SAM surfaces. (C) 1999 Elsevier Science B.V.
引用
收藏
页码:423 / 435
页数:13
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