High-rate deposition of abrasion resistant coatings using a dual-source expanding thermal plasma reactor

被引:8
作者
Schaepkens, M [1 ]
Selezneva, S [1 ]
Moeleker, P [1 ]
Iacovangelo, CD [1 ]
机构
[1] Gen Elect Global Res Ctr, Schenectady, NY 12309 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2003年 / 21卷 / 04期
关键词
D O I
10.1116/1.1575220
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A unique high-rate plasma deposition process has been developed to generate abrasion resistant coatings on polymeric substrates. The process relies on the integration of a plurality of individual expanding thermal plasma sources into a multisource setup. In this work, we will discuss the effects of various hardware and process parameters on the performance of a dual-source system that has been used to apply abrasion resistant coatings to polycarbonate substrates. It will be shown that a properly engineered dual-source system can generate transparent organosilicon-based coatings that provide uniform glasslike abrasion resistance across a 30 cm width on substrates that are laterally translated past the dual-source array. (C) 2003 American Vacuum Society.
引用
收藏
页码:1266 / 1271
页数:6
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