Cation effects on the anodic dissolution of n-Si in fluoride electrolytes

被引:6
作者
Belaidi, A
Fotouhi, B
Cachet, H
Kerbache, T
Chari, A
Ozanam, F
Chazalviel, JN
Gorochov, O
Etman, M
机构
[1] CNRS, Phys Solides Lab, F-92195 Meudon, France
[2] CNRS, Lab Chim Met Terres Rares, F-92195 Meudon, France
[3] Univ Paris 06, Lab Phys Liquides & electrochim, CNRS, UPR 15, F-75252 Paris, France
[4] Univ Constantine, Inst Phys, Dept Energie, Constantine 25000, Algeria
[5] Ecole Polytech, CNRS, Phys Mat Condensee Lab, F-91128 Palaiseau, France
来源
JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 1998年 / 455卷 / 1-2期
关键词
fluoride electrolytes; cations; flatband potential;
D O I
10.1016/S0022-0728(98)00152-1
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Under strong illumination and in the anodic range, current-potential characteristics of n-Si \ fluoride-electrolyte interfaces exhibit the same shape as those of p-Si. The increase of the photocurrent observed in the presence of alkali-metal cations of increasing size is interpreted as for p-Si: in the electropolishing regime, cations act as catalysts for the dissolution of the silicon-oxide layer covering the electrode. In the dark, a negative flatband-potential shift and a decrease in the anodic current are observed in the presence of alkali-metal cations of increasing size. This behaviour, which takes place on hydrogenated surfaces, is accounted for in a kinetic model in which electrochemical transfer takes place through negatively-charged surface states. Cation adsorption favours the presence of a negative charge at the surface, hence the negative charge is increased, thereby decreasing the flatband potential and the charge-transfer rate. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:191 / 195
页数:5
相关论文
共 14 条
[1]  
[Anonymous], POROUS SILICON SCI T
[2]   A VOLTAMMETRIC STUDY OF THE ANODIC-DISSOLUTION OF P-SI IN FLUORIDE ELECTROLYTES [J].
CHAZALVIEL, JN ;
ETMAN, M ;
OZANAM, F .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1991, 297 (02) :533-540
[3]   SCHOTTKY-BARRIER HEIGHT AND REVERSE CURRENT OF THE N-SI-ELECTROLYTE JUNCTION [J].
CHAZALVIEL, JN .
SURFACE SCIENCE, 1979, 88 (01) :204-220
[4]   KINETIC AND DIFFUSIONAL CURRENT CONTRIBUTIONS IN THE ANODIC-DISSOLUTION OF P-SI IMMERSED IN FLUORIDE ELECTROLYTES [J].
ETMAN, M ;
NEUMANNSPALLART, M ;
CHAZALVIEL, JN ;
OZANAM, F .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1991, 301 (1-2) :259-265
[5]  
GERISCHER H, 1988, BER BUNSEN PHYS CHEM, V92, P573
[6]   THE MECHANISM OF THE ANODIC-OXIDATION OF SILICON IN ACIDIC FLUORIDE SOLUTIONS REVISITED [J].
GERISCHER, H ;
ALLONGUE, P ;
KIELING, VC .
BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 1993, 97 (06) :753-756
[7]  
GERSHINSKII AE, 1990, SOV ELECTROCHEM, V25, P1224
[8]  
Harrick N.J., 1974, CHARACTERIZATION SOL, P215, DOI [DOI 10.1007/978-1-4613-4490-2_11, 10.1007/ 978-1-4613-4490-2 11., DOI 10.1007/978-1-4613-4490-211]
[9]   Effect of alkali-metal and some quaternary-ammonium cations on the anodic dissolution of p-Si in fluoride media [J].
Hassan, HH ;
Fotouhi, B ;
Sculfort, JL ;
AbdelRehiem, SS ;
Etman, M ;
Ozanam, F ;
Chazalviel, JN .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1996, 407 (1-2) :105-113
[10]   KINETIC AND DIFFUSIONAL LIMITATIONS TO THE ANODIC-DISSOLUTION OF P-SI IN FLUORIDE MEDIA [J].
HASSAN, HH ;
SCULFORT, JL ;
ETMAN, M ;
OZANAM, F ;
CHAZALVIEL, JN .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1995, 380 (1-2) :55-61