Ultraviolet avalanche photodiode in CMOS technology

被引:13
作者
Pauchard, A [1 ]
Rochas, A [1 ]
Randjelovic, Z [1 ]
Besse, PA [1 ]
Popovic, RS [1 ]
机构
[1] Swiss Fed Inst Technol, EPFL, CH-1015 Lausanne, Switzerland
来源
INTERNATIONAL ELECTRON DEVICES MEETING 2000, TECHNICAL DIGEST | 2000年
关键词
D O I
10.1109/IEDM.2000.904417
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present a simple method that allows the fabrication of ultraviolet-selective avalanche photodiodes in a standard CMOS technology. An efficient guard ring structure is created using the lateral diffusion of two n(well) regions separated by a gap of 0.6 mum. Our photodiodes achieve a very low dark current of only 400 pA/mm(2), an excess noise F = 7 for a mean gain <G > = 20 at lambda = 400nm, and a good gain uniformity.
引用
收藏
页码:709 / 712
页数:4
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