Electromagnetic micro-device realized by electrochemical way

被引:11
作者
Coutrot, AL
Dufour-Gergam, E
Martincic, E
Gilles, JP
Grandchamp, JP
Quemper, JM
Bosseboeuf, A
Alves, F
Ahamada, B
机构
[1] Univ Paris 11, CNRS UMR 8622, Inst Elect Fondamentale, F-91405 Orsay, France
[2] Lab Elect Signaux & Robot, CNRS UPRESA 8029, F-94235 Cachan, France
关键词
micro-moulding; micro-coil; copper; permalloy; electrodeposition;
D O I
10.1016/S0924-4247(01)00503-9
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, realization process and electroplated copper and permalloy properties are presented in order to fabricate micro-coils. RF electrical and magnetic characterizations of the first devices with 40 turns obtained for low frequencies application are exposed showing an inductive behavior under 220 MHz (L = 320 nH) and a capacitive behavior above. Experimental results are compared with calculations. A comparative magnetic field measurement is performed using micro-coils and AMR. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:80 / 84
页数:5
相关论文
共 12 条
[1]   Planar micromachined spiral inductor for integrated magnetic microactuator applications [J].
Ahn, Chong H. ;
Allen, Mark G. .
Journal of Micromechanics and Microengineering, 1993, 3 (02) :37-44
[2]   A comparison of two micromachined inductors (bar- and meander-type) for fully integrated boost DC/DC power converters [J].
Ahn, CH ;
Allen, MG .
IEEE TRANSACTIONS ON POWER ELECTRONICS, 1996, 11 (02) :239-245
[3]   ANOMALOUS CODEPOSITION OF IRON-NICKEL ALLOYS [J].
DAHMS, H ;
CROLL, IM .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (08) :771-&
[4]   A FLUXGATE MAGNETIC SENSOR WITH MICRO-SOLENOIDS AND ELECTROPLATED PERMALLOY CORES [J].
KAWAHITO, S ;
SASAKI, Y ;
SATO, H ;
NAKAMURA, T ;
TADOKORO, Y .
SENSORS AND ACTUATORS A-PHYSICAL, 1994, 43 (1-3) :128-134
[5]   Microcoils fabricated by UV depth lithography and galvanoplating [J].
Lochel, B ;
Maciossek, A ;
Rothe, M ;
Windbracke, W .
SENSORS AND ACTUATORS A-PHYSICAL, 1996, 54 (1-3) :663-668
[6]   COMPETITIVE ADSORPTION EFFECTS IN THE ELECTRODEPOSITION OF IRON-NICKEL ALLOYS [J].
MATLOSZ, M .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (08) :2272-2279
[7]  
NICOLAS S, 1998, P 9 MICR EUR WORKSH
[8]  
Park J. Y., 1997, Microelectronics International, V14, P8
[9]   High Q spiral-type microinductors on silicon substrates [J].
Park, JY ;
Allen, MG .
IEEE TRANSACTIONS ON MAGNETICS, 1999, 35 (05) :3544-3546
[10]  
PUERS R, 1999, P 10 MICR MECH EUR M, P112