Colloquium:: Reactive plasmas as a versatile nanofabrication tool

被引：595

作者：

Ostrikov, K ^{[1
]}

机构：

[1] Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia

[2] Nanyang Technol Univ, NIE, Plasma Sources & Applicat Ctr, Singapore 637616, Singapore

来源：

REVIEWS OF MODERN PHYSICS | 2005年 / 77卷 / 02期

关键词：

D O I：

10.1103/RevModPhys.77.489

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The underlying physics of the application of low-temperature, low-pressure reactive plasmas in various nanoassembly processes is described. From the viewpoint of the "cause and effect" approach, this Colloquium focuses on the benefits and challenges of using plasma-based systems in nanofabrication of nanostructured silicon films, low-dimensional semiconducting quantum structures, ordered carbon nanotip arrays, highly crystalline TiO2 coatings, and nanostructured hydroxyapatite bioceramics. Other examples and future prospects of plasma-aided nanofabrication are also discussed.

引用

页码：489 / 511

页数：23

共 133 条

[1]

[Anonymous], 2004, EPITAXY NANOSTRUCTUR

[2]

Arnoult C, 2004, J MATER SCI TECHNOL, V20, P63

[3]

*ASTM, 2003, F118503 ASTM

[4] Synthesis of highly oriented, single-crystal silicon nanoparticles in a low-pressure, inductively coupled plasma [J].